Method and apparatus for coating a photosensitive material

ABSTRACT

In a method and an apparatus for coating an object with photosensitive material, a roller stabilizes a supply amount of the photosensitive material and is disposed between the object and a slit coater, so that the stabilized photosensitive material is supplied to the object through the slit coater. The photosensitive material includes additives for controlling amount of a solid powder, a boiling point and a surface tension thereof. Accordingly, the photosensitive material may be uniformly coated on the object.

CROSS-REFERENCE TO RELATED APPLICATION

This application relies for priority upon Korean Patent Application No.2002-33320 filed on Jun. 14, 2002, the contents of which are hereinincorporated by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method and an apparatus for coatingan object with a photosensitive material, and more particularly to amethod and an apparatus for uniformly coating an object with aphotosensitive material.

2. Description of the Related Art

As a conventional method for coating a semiconductor substrate with aphotosensitive material in a sheet form, a spin coating method is used.In the spin coating method, the photosensitive material is dropped andcoated on a substrate that is being quickly rotated. That is, thephotosensitive material is coated by a centrifugal force that is appliedto the substrate. The spin coating method is proper to coat a smallsubstrate such as a wafer with the photosensitive material. However, thespin coating method may be improper to coat a large and heavy substratesuch as an LCD panel with the photosensitive material.

In order to coat a large and heavy substrate with a photosensitivematerial, a slit coating method has been proposed. In the slit coatingmethod, the photosensitive material is supplied through a slit nozzlehaving a length thereof longer than a width thereof and is coated in asheet form.

FIG. 1 is a schematic view showing a conventional slit coater.

Referring to FIG. 1, a slit coater 10 changes a photosensitive materialhaving an indeterminate form into a photosensitive material having aband form, which has a length thereof longer than a width thereof. Theslit coater 10 is aligned at a designated position “A” so as to supplythe photosensitive material onto a substrate 40.

FIGS. 2A and 2B are views showing a silt coater and a substratepartially coated with photosensitive material.

Referring to FIG. 2A, the slit coater 10 supplies the photosensitivematerial 20 from a photosensitive material supply apparatus 30 to thesubstrate 40. The photosensitive material 20 supplied from the slitcoater 10 has a band form as shown in FIG. 2B. The slit coater 10 coatsthe substrate 40 with the photosensitive material 20 in a firstdirection and at a first speed.

FIGS. 3A and 3B are views showing the substrate totally coatedphotosensitive material by the slit coater.

Referring to FIGS. 3A and 3B, the slit coater 10 coats the substrate 40with the photosensitive material 20 from the first position “A” to asecond position “B”. In the slit coating method, the photosensitivematerial may be easily coated on an area of substrate greater than thatof a wafer.

FIG. 4 is a sectional view showing a profile of the photosensitivematerial coated on the substrate according to the slit coating method.

Referring FIG. 4, in the slit coating method, a thickness T1 at thefirst position “A” and a thickness T2 at the second position “B” aredifferent from a thickness T3 at a center of the substrate 40, which isunpreferable. Also, the slit coating method causes coating failure aswave patterns or scratch patterns in the coated photosensitive material.Accordingly, the slit coating and spin coating methods are successivelyperformed so as to coat the photosensitive material on the substrate.

When both the slit coating method and the spin coating method areperformed on the same substrate, the time for coating the substrate withthe photosensitive material may greatly increase. Also, since equipmentsfor performing the slit coating method and the spin coating method arerespectively required, cost of equipments may increase.

BRIEF SUMMARY OF THE INVENTION

The present invention provides a method for coating a substrate with aphotosensitive material, so as to have a uniform thickness.

The present invention provides an apparatus for coating a substrate witha photosensitive material, which is suitable for performing the abovemethod.

In one aspect of the invention, in the method for coating a substratewith a photosensitive material, a fluid photosensitive material ischanged into a photosensitive material having a band form that has alength longer than a width thereof. The photosensitive material havingthe band form is supplied onto a first surface for a first time periodso as to stabilize a supply amount of the photosensitive material. Thestabilized photosensitive material is supplied onto the substrate in adirection of the width thereof, which is separated from the firstsurface, so that the substrate is coated with the stabilizedphotosensitive material in a sheet form.

In another aspect of the invention, the apparatus for coating asubstrate with a photosensitive material includes a forming part and astabilizing part. The forming part changes a fluid photosensitivematerial into a photosensitive material having a band form such that alength thereof is longer than a width thereof. The stabilizing partsupplies the photosensitive material having the band form onto a firstsurface for a first time period so as to stabilize a supply amount ofthe photosensitive material. Furthermore, the apparatus includes afixing part and a transferring part. The fixing part fixes the substrateseparated apart from the first surface and the transferring partsupplies the stabilized photosensitive material onto the substrate in adirection of the width such that the substrate is coated with thestabilized photosensitive material in a sheet form.

According to the present invention, the supply amount of thephotosensitive material is stabilized before the photosensitive materialis supplied onto the substrate, so that the photosensitive material maybe uniformly coated on the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other advantages of the present invention will becomereadily apparent by reference to the following detailed description whenconsidered in conjunction with the accompanying drawings wherein:

FIG. 1 is a schematic view showing a conventional slit coater;

FIGS. 2A and 2B are views showing a the silt coater and a substratepartially coated with a photosensitive material;

FIGS. 3A and 3B are views showing the substrate totally coated with aphotosensitive material by the slit coater;

FIG. 4 is a sectional view showing a profile of the photosensitivematerial coated on the substrate according to a conventional slitcoating method;

FIG. 5 is a flow chart showing a method for coating a substrate with aphotosensitive material according to an exemplary embodiment of thepresent invention;

FIG. 6 is a block diagram showing an apparatus for coating a substratewith a photosensitive material according to an exemplary embodiment ofthe present invention;

FIG. 7 is a perspective view showing an apparatus for coating asubstrate with a photosensitive material;

FIG. 8 is a schematic view showing a photosensitive material supplyingunit according to an exemplary embodiment of the present invention;

FIG. 9 is a schematic view showing a photosensitive material supplyingunit according to another exemplary embodiment of the present invention;

FIG. 10A is a perspective view showing a slit coater according to anexemplary embodiment of the present invention;

FIG. 10B is a cross-sectional view taken along the line “A—A” shown inFIG. 10A;

FIG. 10C is a cross-sectional view taken along the line “B—B” shown inFIG. 10A;

FIGS. 11 and 12 are schematic views showing a photosensitive materialforming unit for supplying the photosensitive material to the coatingamount controlling roller according to an exemplary embodiment of thepresent invention; and

FIGS. 13 and 14 are schematic views showing the photosensitive materialcoated on the substrate according to an exemplary embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 5 is a flow chart showing a method for coating a substrate with aphotosensitive material according to an exemplary embodiment of thepresent invention.

Referring to FIG. 5, in a method for coating a substrate with aphotosensitive material, a form of a fluid photosensitive material ischanged into a photosensitive material having a band form (step S1), asupply amount of the photosensitive material is stabilized before thephotosensitive material is supplied onto the substrate (step S2) and thesubstrate is coated with the stabilized photosensitive material (stepS3).

Particularly, in step S1, the fluid photosensitive material is changedinto the photosensitive material having the band form, so that thephotosensitive material has a length longer than a width thereof. Thephotosensitive material having the band form may be obtained by passingthe fluid photosensitive material through a slot having a length longerthan a width thereof. The above procedure is performed to coat thesubstrate with the photosensitive material in a sheet form.

The photosensitive material having the band form may be differentlysupplied to the substrate in the supply amount by positions of thesubstrate. That is, the photosensitive material is not uniformly coatedon the substrate.

In order to prevent the photosensitive material from being non-uniformlycoated on the substrate, the photosensitive material is stabilized (stepS2) so that the photosensitive material is uniformly supplied onto thesubstrate after the fluid photosensitive material is changed into thephotosensitive material having the band form.

In order to stabilize the supply amount of the photosensitive material,the photosensitive material having the band form is supplied to anobject for testing such as a roller, a plate or the like for a firsttime period before the photosensitive material is supplied to thesubstrate. The first time period is required for supplying a sufficientamount of the photosensitive material. The photosensitive materialhaving the band form is supplied to the testing object continuouslymoving during the first time period from about 1 second to about 5seconds.

After stopping the supplying of the photosensitive material, thephotosensitive material is transferred to the substrate. Thephotosensitive material is pressurized at a predetermined pressure so asto coat the photosensitive material onto the substrate (step S3).

As aforementioned above, the photosensitive material having the bandform is supplied to the substrate after stabilizing the supply amount ofthe photosensitive material having the band form discharged from theslit coater. Therefore, the photosensitive material may be uniformlycoated on the substrate.

In order to uniformly coat the photosensitive material, thephotosensitive material may include additives such as a solid powderthat may chemically react on the light and a volatile solvent. The solidpowder influences the viscosity of the photosensitive material. That is,the more the photosensitive material includes the solid powder, the morethe viscosity of the photosensitive material rises. If thephotosensitive material having a high viscosity is coated on thesubstrate, patterns such as spot patterns or scratch patterns may appearin the coated photosensitive material. Also, the viscosity of thephotosensitive material greatly influences the coating speed of thephotosensitive material. That is, the more the viscosity of thephotosensitive material rises, the more the coating speed is lowered.

In order to prevent the decrease in the coating speed of thephotosensitive material and the appearance of the patterns, thephotosensitive material comprises the solid power from about 5 wt % toabout 25 wt % and the volatile solvent from about 95 wt % to about 75 wt%.

Additionally, a drying time is an important factor in the photosensitivematerial. If the drying time of the photosensitive material is soreduced, the supply amount of the photosensitive material may be alteredbecause the photosensitive material may be dried while being suppliedonto the substrate and the photosensitive material may be randomlycoated onto the substrate.

In order to control the drying time of the photosensitive material, thephotosensitive material may further include a drying delaying agent fordelaying the drying time thereof. As one of exemplary embodiments of thepresent invention in order to control the drying time, thephotosensitive material may be mixed with the drying delaying agenthaving a boiling point higher than that of the volatile solvent.

However, if the amount of the drying delaying agent for delaying thedrying time that is mixed with the photosensitive material is excessive,the drying of the photosensitive material may not be smoothly achieved.Accordingly, the photosensitive material includes the drying delayingagent from about 10 wt % to about 80 wt %. More preferably, thephotosensitive material includes the drying delaying agent below about50 wt %.

Further, the surface tension of the photosensitive material is greatlyimportant factor. The surface tension of the photosensitive materialinfluences the thickness uniformity of the photosensitive materialcoated onto the substrate.

In consideration of the influence thereof on the surface tension, thephotosensitive material further includes a surfactant, for example, suchas a fluorine-containing surfactant or a silicon-containing surfactant.In the exemplary embodiment of the present invention, the photosensitivematerial includes the surfactant from about 200 ppm to about 5,000 ppm.

Particularly, in step of coating the substrate with the photosensitivematerial (step S3), the photosensitive material is pressurized at afirst pressure during a second time period so as to improve thethickness uniformity of the photosensitive material. The photosensitivematerial is allowed to stand-by during a third time period until thesupply amount of the photosensitive material reaches to a target amount.After the third time period, the photosensitive material is dischargedat a second pressure.

In detail, the photosensitive material is pressurized during the secondtime period, for example, approximately 0.1 second, until a pressureapplied to the photosensitive material reaches to the first pressure.The photosensitive material is allowed to stand-by during the third timeperiod, for example, approximately 0.7 second until the supply amount ofthe photosensitive material reaches to the target amount. Finally, thephotosensitive material is discharged at the second pressure.

As another method, the photosensitive material is pressurized during thesecond time period, for example approximately 1 second, until a pressureapplied to the photosensitive material reaches to the first pressure.The photosensitive material is allowed to stand by during the third timeperiod, for example approximately 0.2 second until the supply amount ofthe photosensitive material reaches to the target amount. Finally, thephotosensitive material is discharged at the second pressure. The thirdtime period becomes shorter according as the first time period islonger.

Also, the thickness of the photosensitive material coated on the objectfor test in the stabilizing step (step S2) is very important because thethickness of the photosensitive material coated on the substrate dependson the thickness of the photosensitive material coated on the object fortest. In this exemplary embodiment, the thickness of the photosensitivematerial coated on the object for test is from about 10 μm to about 200μm.

In step S3, the thickness of the photosensitive material coated on thesubstrate is also important. In consideration of the coating thickness,the thickness of the photosensitive material coated on the substrate ismeasured at a first position of the substrate and at a second positionof the substrate, which is spaced apart from the first position. Thephotosensitive material that remains in the slit coater is sucked andremoved after the photosensitive material is coated on the substrate.

Finally, the photosensitive material coated on the substrate is driedwithout an additional process such as a spin coating.

Hereinafter, an apparatus according to the exemplary embodiment of thepresent invention will be described in detail with reference toaccompanying drawings.

FIG. 6 is a block diagram showing an apparatus for coating a substratewith photosensitive material according to an exemplary embodiment of thepresent invention.

Referring to FIG. 6, a photosensitive material coating apparatus 800includes a photosensitive material forming unit 100, a coating amountcontrol unit 200, a fixing unit 300, a transferring unit 400 and acontrol unit 700. The photosensitive material coating apparatus 800further includes a gap measuring unit 500 and a gap control unit 600.

FIG. 7 is a perspective view showing a constitution of the apparatus forcoating the substrate with photosensitive material as shown in FIG. 6.

Referring FIG. 7, the photosensitive material forming unit 100 includesa photosensitive material supplying unit 140 and a slit coater 180. Thephotosensitive material forming unit 100 changes the fluidphotosensitive material into the photosensitive material having the bandform that has a length longer than a width thereof.

FIG. 8 is a schematic view showing a photosensitive material supplyingunit according to an exemplary embodiment of the present invention.

Referring to FIG. 8, the photosensitive material supplying unit 140includes a pump 141 and a tank 142. The tank 142 stores thephotosensitive material with additives.

The photosensitive material includes a solid powder from about 5 wt % toabout 25 wt % and a volatile solvent from about 95 wt % to about 75 wt%.

The additives include a surfactant and a drying delaying agent. Thephotosensitive material includes the surfactant from about 200 ppm toabout 5,000 ppm. The photosensitive material also includes the dryingdelaying agent from about 80 wt % to about 10 wt % having a boilingpoint higher than that of the photosensitive material.

The tank 142 stores the photosensitive material having the abovecompositions and the photosensitive material stored in the tank 142 issupplied to the slit coater 180.

FIG. 9 is a schematic view showing a photosensitive material supplyingunit according to another exemplary embodiment of the present invention.

Referring to FIG. 9, a tank 149 includes a solid powder supplying unit143, a solvent supplying unit 145, a boiling point control unit 145, asurfactant supplying unit 146 and a mixing tank 147.

The solid powder supplying unit 143 supplies the solid powder to themixing tank 147. The solid powder supplying unit 143 may further includea control unit (not shown) to precisely supply the solid powder to themixing tank 147. The photosensitive material in the mixing tank 147includes the solid powder from about 5 wt % to about 25 wt %.

The solvent supplying unit 144 supplies the volatile solvent to themixing tank 147. The solvent supplying unit 144 may further include acontrol unit (not shown) to accurately supply an amount of the volatilesolvent to the mixing tank 147. The photosensitive material in themixing tank 147 includes the volatile solvent from about 95 wt % toabout 75 wt %.

The photosensitive material includes the solid powder supplied from thesolid powder supplying unit 143 and the volatile solvent supplied fromthe solvent supplying unit 144. The photosensitive material may furtherinclude a drying delaying agent for controlling the drying time of thephotosensitive material and a surfactant for controlling the surfacetension of the photosensitive material.

The boiling point control unit 145 supplies the drying delaying agent tothe mixing tank 147 that stores the solid powder and the volatilesolvent. The boiling point control unit 145 may further include acontrol unit (not shown) to accurately supply an amount of the dryingdelaying agent to the mixing tank 147. The photosensitive material inthe mixing tank 147 includes the drying delaying agent from about 10 wt% to about 80 wt %.

The surfactant supplying unit 146 supplies the surfactant to the mixingtank 147 that is storing the solid powder, the volatile solvent and thedrying delaying agent. The surfactant supplying unit 145 may furtherinclude a control unit (not shown) to accurately supply an amount of thesurfactant to the mixing tank 147. The photosensitive material in themixing tank 147 includes the surfactant from about 200 ppm to about5,000 ppm. The surfactant may also be a fluorine-containing surfactant.

The mixing tank 147 stores the solid powder, the volatile solvent, thedrying delaying agent and the surfactant. The mixing tank 147 includes astirrer (not shown) so as to completely mix the solid powder, thevolatile solvent, the drying delaying agent and the surfactant.

The pump 141 pressurizes the inside of the mixing tank 147 so that thephotosensitive material that is mixed with the additives is suppliedinto the slit coater 180.

FIG. 10A is a perspective view showing a slit coater according to theexemplary embodiment of the present invention, FIG. 10B is across-sectional view taken along the line “A—A” shown in FIG. 10A, andFIG. 10C is a cross-sectional view taken along the line “B—B” shown inFIG. 10A.

Referring to FIGS. 10A to 10C, the slit coater 180 includes a body 182,a supply passageway 184, a buffer 186 and a slit nozzle 188.

The body 182 includes a photosensitive material supplying portion 182 a,a photosensitive material discharging portion 182 b and side portions182 c and 182 d. As an exemplary embodiment of the present invention,the photosensitive material supplying portion 182 a has a rectangularshape having a first width and a first length. The photosensitivematerial discharging portion 182 b has a second width shorter than thefirst width and a second length same to the first length. Thephotosensitive material supplying portion 182 a and the photosensitivematerial discharging portion 182 b are disposed in parallel to eachother. The side portions 182 c and 182 d connect the photosensitivematerial supplying portion 182 a to the photosensitive materialdischarging portion 182 b. The body 182 is provided with the supplypassageway 184, the buffer 186 and the slit nozzle 188, which aredisposed therein.

Referring to FIGS. 10B and 10C, the supply passageway 184 extends fromthe photosensitive material supplying portion 182 a to thephotosensitive material discharging portion 182 b. The photosensitivematerial supplied from the photosensitive material supplying unit 140 isprovided to the slit coater 180 through the supply passageway 184.

The buffer 186 is connected to the supply passageway 184 in a T shape.The buffer 186 buffers the photosensitive material supplied through thesupply passageway 184 to be stably supplied to the photosensitivematerial discharging portion 182 b. The buffer 186 has a tubular shapehaving a diameter from about 3 mm to about 5 mm.

The slit nozzle 188 is connected to the buffer 186. The slit nozzle 188has a first width and a first length appropriate to discharge thephotosensitive material having the band form. The first width of theslit nozzle 188 is from about 50 μm to about 100 μm and the first lengthof the slit nozzle 188 is from about 10 mm to about 35 mm.

Accordingly, the photosensitive material having the band formcorresponding to the first width and the first length is discharged fromthe photosensitive material forming unit 100. In generally, thephotosensitive material is not uniformly discharged at an initial stagefrom the photosensitive material forming unit 100.

In the exemplary embodiment of the present invention, the photosensitivematerial is coated on the substrate after the discharging amount of thephotosensitive material discharged from the photosensitive materialforming unit 100 is uniformly adjusted.

Referring to again FIG. 7, the photosensitive material discharged fromthe photosensitive material forming unit 100 is temporarily coated onthe coating amount control unit 200. The coating amount control unit 200includes a roller 210, a motor 220 for rotating the roller 210 and ablade 230 for removing the photosensitive material coated on the roller210.

More particularly, the roller 210 has a length corresponding to thelength of the photosensitive material discharged through the slit nozzle188. The motor 220 is connected to a rotation shaft (not shown) of theroller 210. The photosensitive material from the photosensitive materialforming unit 100 is supplied to the roller during a predetermined timeperiod, for example, about 5 seconds.

Accordingly, the surface of the roller 210 is coated with thephotosensitive material. The photosensitive material coated on theroller 210 is hardened with the lapse of time. The blade 230 removes thehardened photosensitive material on the roller 210. The blade 230disposed adjacent to the roller 210 has a thin plate shape and a lengthcorresponding to the length of the roller 210. A gap between the roller210 and the photosensitive material discharging portion 182 b is fromabout 10 μm to about 200 μm.

Referring to the FIG. 7, the fixing unit 300 fixes the substrate 310using a vacuum suction method. The fixing unit 300 is disposed adjacentto the coating amount control unit 200.

The transferring unit 400 includes a transferring bar 430, a slit coatertransferring unit 440 and a slit coater fixing unit 450. Thetransferring bar 430 includes two bars 410 and 420 (hereinafter,referred to as transferring bar 430) disposed in parallel to each otherand extended in a direction to which the slit coater 180 is transferred.The slit coater transferring unit 440 is connected to the transferringbar 430. The slit coater transferring unit 440 transfers the slit coater180 along the transferring bar 430 without trembling. The slit coaterfixing unit 450 has a first end combined with the slit coater transferunit 440 and a second end combined with the slit coater 180.

The gap control unit 600 is disposed between the slit coater fix unit450 and the slit coater transfer unit 440 so as to lift the slit coater180 up and down. The gap control unit 600 controls a gap between theslit coater 180 and the substrate 310. The gap between the slit coater180 and the substrate 310 controlled by the gap control unit 600 is fromabout 50 μm to about 150 μm.

The gap measuring unit 700 is installed at the side portion 182 c of theslit coater 180 and measures the gap between the slit coater 180 and thesubstrate 310. The photosensitive material coating apparatus 800 mayinclude a pair of gap measuring units. The gap measuring unit 700measures the gap in a manner such that a laser beam is irradiated to thesubstrate 310 and is reflected from the substrate 310.

FIGS. 11 and 12 are schematic views showing a photosensitive materialforming unit for supplying the photosensitive material to the coatingamount controlling roller according to an exemplary embodiment of thepresent invention.

Referring to FIG. 11, the slit coater 180 of the photosensitive materialforming unit 100 is transferred to the upper portion of the roller 210of the coating amount control unit 200 by the transferring unit 400.Subsequently, the photosensitive material 141 from the photosensitivematerial supplying unit 140 is supplied to the roller 210 that is beingrotated, through the slit nozzle 188 of the slit coater 180.

Referring to FIG. 12, the photosensitive material 141 is supplied to theroller 210 during the first time period so as to coat the photosensitivematerial on an end portion of the slit nozzle 188.

FIGS. 13 and 14 are schematic views showing the photosensitive materialcoated on the substrate according to an exemplary embodiment of thepresent invention.

Referring to FIG. 13, the slit coater 180 is transferred to the fixingunit 300 while the photosensitive material is not supplying from thephotosensitive material supplying unit 140 after the first time period.

Subsequently, the slit coater 180 is transferred to the fixing unit 300and stopped at a predetermined position. The photosensitive materialsupplying unit 140 applies the predetermined pressure to thephotosensitive material during the second time period. Accordingly, thephotosensitive material is discharged from the slit coater 180. Thephotosensitive material supplying apparatus 140 continuously suppliesthe photosensitive material to the substrate 310 during the third timeperiod until the supplied amount of the photosensitive material reachesto a predetermined amount of the photosensitive material.

Referring to FIG. 14, the slit coater 180 begins the coating operationwith movement by the transferring unit 400, thereby uniformly coatingthe photosensitive material on the substrate 310.

Although exemplary embodiments of the invention have been described, itwill be understood by those skilled in the art that the presentinvention should not be limited to the described preferred embodiment,but various changes and modifications can be made within the spirit andscope of the invention as defined by the appended claims.

1. A method for coating an object with a photosensitive material,comprising: changing a fluid photosensitive material into aphotosensitive material having a band form at a source, thephotosensitive material having a length longer than a width thereof;supplying the photosensitive material having the band form from thesource to a first surface, which is isolated from the object, for afirst time period to stabilize a supply amount of the photosensitivematerial; pressurizing the photosensitive material at the source toreach to a first pressure for a second time period; allowing thephotosensitive material to stand by during a third time period until asupply amount of the photosensitive material reaches a target amount;and supplying the photosensitive material that has reached a targetamount from the source to the object, which is isolated from the firstsurface, at a second pressure in a direction of the width, the objectbeing coated with the stabilized photosensitive material in a sheetform.
 2. The method of claim 1, wherein the photosensitive materialcomprises a solid powder from about 5 wt % to about 25 wt % and avolatile solvent from about 95 wt % to about 75 wt % so as to increase acoating speed of the photosensitive material.
 3. The method of claim 1,wherein the photosensitive material comprises a drying delaying agentfor delaying a drying time of the photosensitive material.
 4. The methodof claim 3, wherein the drying delaying agent comprises a boiling pointhigher than that of the photosensitive material, the photosensitivematerial comprising the drying delaying agent from about 10 wt % toabout 80 wt %.
 5. The method of claim 1, wherein the photosensitivematerial comprises a surfactant for decreasing a surface tensionthereof.
 6. The method of claim 5, wherein the surfactant comprises afluorine-containing surfactant.
 7. The method of claim 5, wherein thephotosensitive material comprises the surfactant from about 200 ppm toabout 5,000 ppm.
 8. The method of claim 1, wherein a height of thephotosensitive material coated on the first surface is from about 10 μmto about 200 μm.
 9. The method of claim 1, wherein the coating of thephotosensitive material further comprises: measuring a height of thephotosensitive material coated on a first position of the object; andmeasuring a height of the photosensitive material coated on a secondposition of the object spaced from the first position.
 10. The method ofclaim 1, further comprising drying the photosensitive material after thecoating of the photosensitive material.
 11. The method of claim 1,further comprising sucking in the remaining photosensitive material intothe source after the coating of the photosensitive material on theobject.